Please use this identifier to cite or link to this item: http://hdl.handle.net/10321/1661
Title: Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface
Authors: Beckmann, C. 
Zhang, Kun 
Hofsäss, Hans 
Brüsewitz, C. 
Vetter, U. 
Bharuth-Ram, Krish 
Issue Date: 2015
Publisher: Elsevier
Source: Beckman, et al. 2015. Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface. Applied Surface Science. 357: 493-497
Abstract: The formation of Fe silicides in surface ripple patterns, generated by erosion of a Si surface with keV Ar and Xe ions and simultaneous co-deposition of Fe, was investigated with conversion electron Mössbauer spectroscopy, atomic force microscopy and Rutherford backscattering spectrometry. For the dot and rip-ple patterns studied, we find an average Fe concentration in the irradiated layer between 6 and 25 at.%. The Mössbauer spectra clearly show evidence of the formation of Fe disilicides with Fe content close to 33 at.%, but very little evidence of the formation of metallic Fe particles. The results support the process of ion-induced phase separation toward an amorphous Fe disilicide phase as pattern generation mecha-nism. The observed amorphous phase is in agreement with thermodynamic calculations of amorphous Fe silicides.
URI: http://hdl.handle.net/10321/1661
ISSN: 0169-4332
Appears in Collections:Research Publications (Management Sciences)

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