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|Title:||Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface||Authors:||Beckmann, C.
|Issue Date:||2015||Publisher:||Elsevier||Source:||Beckman, et al. 2015. Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface. Applied Surface Science. 357: 493-497||Abstract:||The formation of Fe silicides in surface ripple patterns, generated by erosion of a Si surface with keV Ar and Xe ions and simultaneous co-deposition of Fe, was investigated with conversion electron Mössbauer spectroscopy, atomic force microscopy and Rutherford backscattering spectrometry. For the dot and rip-ple patterns studied, we ﬁnd an average Fe concentration in the irradiated layer between 6 and 25 at.%. The Mössbauer spectra clearly show evidence of the formation of Fe disilicides with Fe content close to 33 at.%, but very little evidence of the formation of metallic Fe particles. The results support the process of ion-induced phase separation toward an amorphous Fe disilicide phase as pattern generation mecha-nism. The observed amorphous phase is in agreement with thermodynamic calculations of amorphous Fe silicides.||URI:||http://hdl.handle.net/10321/1661||ISSN:||0169-4332|
|Appears in Collections:||Research Publications (Management Sciences)|
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