Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface
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Copyright: 2015. Elsevier. Due to copyright restrictions, only the abstract is available. For access to the full text item, please consult the publisher's website. The definitive version of the work is published in Applied Surface Science, Vol 357, 493-497; http://dx.doi.org/10.1016/j.apsusc.2015.09.057
The formation of Fe silicides in surface ripple patterns, generated by erosion of a Si surface with keV Ar and Xe ions and simultaneous co-deposition of Fe, was investigated with conversion electron Mössbauer spectroscopy, atomic force microscopy and Rutherford backscattering spectrometry. For the dot and rip-ple patterns studied, we ﬁnd an average Fe concentration in the irradiated layer between 6 and 25 at.%. The Mössbauer spectra clearly show evidence of the formation of Fe disilicides with Fe content close to 33 at.%, but very little evidence of the formation of metallic Fe particles. The results support the process of ion-induced phase separation toward an amorphous Fe disilicide phase as pattern generation mecha-nism. The observed amorphous phase is in agreement with thermodynamic calculations of amorphous Fe silicides.
Beckman, et al. 2015. Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface. Applied Surface Science. 357: 493-497